Reactive sputtering 翻译

WebIn reactive sputtering, the sputtered particles from a target material undergo a chemical reaction aiming to deposit a film with different composition on a certain substrate. The … WebAug 1, 1990 · Using an improved reactive sputter deposition technique, zirconium dioxide is deposited on cooled and uncooled substrates at low, medium, and high rates of 51.7, 95.4, and 152.4 nm/min, respectively. The films are deposited by sputtering a Zr target in an oxygen--argon plasma. The Zr target remains in the metallic state.

Reactive Sputtering - an overview ScienceDirect Topics

Webatoms through the gas phase, the course starts with a few definitions regarding reactive sputtering to show that the processes driving this technique are general applicable. This introduction assists the attendee to the next step : the description of the most common experiment during reactive magnetron sputtering, the hysteresis experiment. WebReactive sputtering source 反应溅射源 . Read diode 里德二极管 . Recombination 复合 . Recovery diode 恢复二极管 . Reciprocal lattice 倒核子 . Recovery time 恢复时间 . Rectifier … how do you treat covid virus https://jeffstealey.com

sputter中文(繁体)翻译：剑桥词典 - Cambridge Dictionary

WebMay 12, 2024 · Thus, the reactive sputtering technology, which could introduce Ti 2 O 3 and Ti 3 O 5 into the TiO 2 films, might adjust the light absorption to the visible range. The films containing simply ... WebReactive sputtering is a technique used to produce thin film coatings with precisely regulated stoichiometry and structure for Physical vapor deposition (PVD). A … WebReactive sputtering is widely utilized in the production of hard coatings, hydrogenated-DLC films, thin-film resistors and dielectrics, semiconductors, glass and optical coatings, solar … phoniatrie bad gögging

What is Reactive Sputtering? - Semicore Equipment Inc.

Category:DC reactively sputtered TiNx thin films for capacitor electrodes ...

Tags:Reactive sputtering 翻译

Reactive sputtering 翻译

Mechanism of rf reactive sputtering - 百度学术

WebReactive sputtering is a versatile technique used to form compact films with excellent homogeneity. In addition, it allows easy control over deposition parameters such as gas … WebReactive sputtering is defined by the reaction between atoms sputtered from a metal target and reactive gas molecules diffused from a discharge gas on the substrate to produce …

Reactive sputtering 翻译

Did you know?

WebFeb 22, 2024 · Deposition using sputtering is a method of creating thin films of a few nanometers to a few micrometers on the desired substrate. In this process, the atoms … WebIn reactive sputtering, thin films of compounds are deposited on substrates by sputtering from metallic (not nonmetallic) targets in the presence of a reactive gas usually mixed …

WebSep 27, 2024 · Yttria-stabilized zirconia (YSZ) thin films were deposited using direct current (reactive and metallic) and radio frequency magnetron sputtering. The effect of the deposition technique and annealing treatment on the microstructure and crystallinity of the thin films was assessed. Using the films produced in this work, oxygen gas sensors were … WebA heat-sensitive layer (TiO2-x) was successfully deposited by RF reactive magnetron sputtering for infrared (IR) image sensors at different relative mass flow of oxygen gas (R-O2) levels. The deposition rate was decreased with an increase in the percentage of R-O2 from 3.4% to 3.7%.

WebReactive sputtering is a process that allows compounds to be deposited by introducing a reactive gas (typically oxygen or nitrogen) into the plasma which is typically formed by an inert gas such as argon (most common), …

WebJun 20, 2013 · Sputtering is a common technique for Physical Vapor Deposition (PVD), one of the methods of producing Thin Film Coatings. Standard Sputtering uses a target of …

Webco-sputtering的中文意思：共溅射…，查阅co-sputtering的详细中文翻译、例句、发音和用法等。 co-sputtering中文_co-sputtering是什么意思 繁體版 English 日本語 how do you treat cystic acneWebA new approach in describing the reactive sputtering process is developed by applying a mass balance and the first and second laws of thermodynamics. The developed model involves macroparameters vers phoniatrie lachenWebMay 1, 2009 · (Color online) Effect of source type on the XRD pattern for sputtering at 200 and 400 W at 6.0 Pa . Phases m and t are the monoclinic Zr O 2 and tetragonal Zr O 2 , respectively. phoniatrie großhadernWebApr 11, 2024 · 半导体产业作为一个起源于国外的技术，很多相关的技术术语都是用英文表述。且由于很多从业者都有海外经历，或者他们习惯于用英文表述相关的工艺和技术节点，那就导致很多的英文术语被翻译为中文之后，很多人不能对照得上，或者不知道怎么翻译。 phoniatrie hanauWebApr 25, 2024 · Experimental procedure. A reactive DC magnetron sputtering system was utilized to deposit TiN films onto heavily boron-doped (< 10 −2 Ω cm) silicon substrates (20 × 20 mm 2 ). Each Si wafer underwent a standard RCA cleaning process, and then was immerged in 10% HF for 3 min to remove the native oxide layer. phoniatrie hagenWebReactive sputtering is a type of SPUTTERING where a target of one chemical composition (e.g. elemental Si) is sputtered in the presence of a gas or a mixture of gasses (e.g. Ar + … phoniatrie ludwigshafenWebApr 9, 2024 · Therefore, sputtering is applied as an effective deposition technology for growing Cu 2 O films on various substrates. The general sputtering method for growing Cu 2 O films is reactive DC sputtering, where plasma is generated by injecting an appropriate amount of oxygen (O 2) gas into a copper (Cu) target [30,31,32]. A. phoniatrie halle